R.A. Yankov, A. Kolitsch, J. von Borany, F. Munnik, S. Gemming, A. Alexewicz, H. Bracht, H. Rösner, A. Donchev, M. Schütze
Advanced Engineering Materials 16 (2014), 52-59, DOI: 10.1002/adem.201300071
Analysis data detailing the microstructure of fluorine-implanted γ-TiAl alloys are presented. Correlations are done among the shape of the F implant profiles, the F dose, and the quality of the resulting oxide scale after high-temperature exposure to air. It is shown that good oxidation protection is associated with Gaussian-type as-implanted F profiles coupled with optimal F doses over a narrow window of about 5.0–9.0 × 1017 cm−2.
